AtenRa
Lifer
- Feb 2, 2009
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DP is something I'm not sure is even relevant in this context, today. It's a litho RET technique though. As in, allowing better optical focusing for small features and edges. Using it creates complexity... limitations to the chip design, performance and variability (like misalignment between critical layers) tho.
In order for 14nm LPP to get the highest density and smallest SRAM size you must use a lot of M1 (Metal layer) in your IC design, in order to use the M1 in the 14nm LPP you need to go for Double Patterning.
As i have tried to explain earlier and like you said, because of the problems associated with Double Patterning (misalignment etc) it elevates the total cost of the wafer and thus the price of the final product.
But in order for your design to use all the 14nm FF capabilities of the process (14nm LPP) you need to use M1 in order to get the highest density and highest performance. If you will not use any M1 layers your end product (Chip) will be cheaper (No Double Patterning) but it will be bigger (lower density) and will have lower performance (higher resistance) and higher consumption (higher resistance).
So when they say they will use "density-optimised version of 14nm FinFET" they most probably are going to use a lot of M1 layers and talking about double patterning and not HDL like we had on 28nm.